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Entire industry chain model of photoresist, full category of semiconductor photoresist

ArF PhotoresistKrF PhotoresistI-LINE PhotoresistE-beam Photoresist Encapsulation Photoresist

E-beam Photoresist

Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.

It can provide products in different systems such as PMMA, PHS, P(MCA/MST), HSQ, etc., including two types of positive and negative, with the advantages of high resolution and etch resistance. The technology and production capacity have reached the international level, and it is currently the only company in China that can provide electron beam resist. Entered sales in 2015, serving more than 15+ customers.

Exposure wavelength Product Name Technical nodes and applications Process capability CD Process capability THK Image
E-beam photoresist RE209 Micro-nano processing 0.012um 0.24um
E-beam photoresist RE300 series Micro-nano processing 0.05um 0.12-0.6
E-beam photoresist RE650 Micro-nano processing 0.04um 0.2-0.3um
E-beam photoresist RE500 Micro-nano processing 0.02um 0.12um
E-beam photoresist NRE800 Micro-nano processing 0.03um 0.2-0.35um
5 Records
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